Equipment List

We have always operated under the assumption that a wafer's quality is primarily dictated by the equipment used in its manufacture. We have therefore worked to procure the best equipment possible and have expended maximum resources on the maintenance staff and the maintenance of our equipment and facility.

Photomasking

• 3 Ultratech UT 1000WF steppers

• 2 Canon MPA/PLA-501FA proximity printers

• 1 EV640 frontside/backside wafer aligner

• 6 spin tracks/softbake

• 3 developer baths

• 4 autohandling microscopes

Thin Film

• 2 Novellus Concept I PECVD reactors

• 2 Varian 3190 sputter systems

Dry Etch

• 3 Tegal 903E etchers

• 3 IPC resist strippers

• 1 Megastrip resist stripper

Diffusion Tubes Bruce/GMI

• 1 POCl3

• 1 high temp furnace (1280°C)

• 1 BBr3

• 1 LPCVD Si3N4 (+ low stress)

• 1 LPCVD polysilicon (+ amorphous)

• 1 LPCVD SiO2 (+ PH3)

• 5 oxidation furnaces

Gold Processing

• 1 planetary rotation gold evaporator

• 3 separate gold tubes for gold compensation/gold kill diffusion and backside Au alloy

Parametric Test

• 1 Reedholm LOMAC RI-20 parametric tester

• 1 Electroglas 2001X automated prober

• 1 MicroManipulator station

• 1 HP4140B picoammeter

• 1 Materials Development Corporation CSM/2 C-V plotter

Other

• QuickSil maintains an on-going working relationship with other wafer service vendors in Silicon Valley
  and is happy to obtain access to additional equipment as necessary for our customers.