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QuickSil builds a wide variety of vertical and lateral double-diffused MOS Products for customers making high current and high voltage devices. Our technologies include both polysilicon
and metal gate processes.
Our facility was designed from the outset to produce products of this type and this
capability has been maintained and improved on over time.
These processes are now fully implanted, which in combination with printing using steppers and dry etch results in
excellent parametric control and simplified processing.
DMOS integrated circuits of medium complexity for specialized applications are also manufactured on site as well
as processes incorporating bonded substrates.
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